钙钛矿(结构)
沉积(地质)
材料科学
化学气相沉积
卤化物
薄膜
体积流量
原子层沉积
化学工程
热力学
化学
纳米技术
无机化学
结晶学
物理
沉积物
工程类
生物
古生物学
作者
Chongqiu Yang,Terrence W. Simon,Tianhong Cui
摘要
Applications of metal halide perovskite have been rapidly developing in recent years. However, very little research focusing on basic growth kinetics of perovskite films can be found in the literature. This paper discusses a hybrid physical-chemical deposition process of planar perovskite films. A 2-D ANSYS Fluent simulation is presented to calculate the heat and mass transfer during the deposition process. An optimized mass flow configuration with a flow resistance imposed by a porous screen is shown to give a uniform distribution of the methylammonium iodide vapor precursor and an even surface deposition rate of perovskite films. Both steady and transient calculations indicate that increasing operating temperature or vessel pressure within certain limits can boost the surface deposition rate of perovskite. Limitations on working pressure are presented for preventing reverse flow into the chamber and associated deterioration of deposition uniformity of the perovskite films.
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