残余应力
衍射
材料科学
X射线晶体学
残余物
压力(语言学)
失真(音乐)
格子(音乐)
光学
结晶学
复合材料
物理
数学
化学
算法
声学
光电子学
放大器
语言学
哲学
CMOS芯片
标识
DOI:10.31399/asm.hb.v10.a0001761
摘要
Abstract In x-ray diffraction residual stress measurement, the strain in the crystal lattice is measured, and the residual stress producing the strain is calculated, assuming a linear elastic distortion of the crystal lattice. This article provides a detailed account of the plane stress elastic model, and describes the most common methods of x-ray diffraction residual stress measurement, namely, single-angle and two angle techniques. It elaborates the major steps involved in x-ray diffraction residual stress measurement, explaining the possible sources of error in stress measurement. The article also outlines the applications of x-ray diffraction residual stress measurement with examples.
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