Lv4
415 积分 2021-06-04 加入
Investigation of FinFET with Multi-Channel Structures on Device Characteristics
3个月前
已完结
Dry Etching of Tapered Contact Holes Using Multilayer Resist
5个月前
已完结
Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4
5个月前
已完结
Evidence of direct SiO2 etching by fluorocarbon molecules under ion bombardment
5个月前
已完结
Near-surface residue formation in CF4/H2 reactive ion etching of silicon
5个月前
已完结
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
5个月前
已完结
Dry Etching of SiO2Thin Films with Perfluoropropenoxide–O2and Perfluoropropene–O2Plasmas
5个月前
已完结
Selective dry etching of silicon containing anti-reflective coating
5个月前
已完结
The effects of etch chemistry on the etch rates of ArF BARC products
5个月前
已完结
Nucleation and growth during tungsten atomic layer deposition on SiO2 surfaces
5个月前
已完结
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