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Recent progress on defect-engineering in ferroelectric HfO2: The next step forward via multiscale structural optimization
2天前
已完结
A manufacturing lithographic approach for high density MRAM device using KrF double mask patterning technique
5天前
已关闭
Study of Over-Etching Behaviors on Silicon Nitride Patterned Wafers
5天前
已完结
Structural Polymorphism Kinetics Promoted by Charged Oxygen Vacancies in HfO 2
8天前
已完结
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