Lv11
30 积分 2025-03-08 加入
A Two-Step Dry Etching Model for Non-Uniform Etching Profile in Gate-All-Around Field-Effect Transistor Manufacturing
1小时前
已完结
First Large-Scale (68 × 25 × 5 nm3) Atomistic Modeling for Accurate and Efficient Etching Process Based on Machine Learning Molecular Dynamics (MLMD)
2小时前
已完结
Tunneling spectroscopy of the (110) surface of direct-gap III-V semiconductors
6个月前
已完结
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