Lv11
10 积分 2025-01-15 加入
Study on the polishing performance and mechanism of sapphire wafers by different types of degradable surfactants
1小时前
待确认
Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions
3个月前
已完结
Effect of Non-Ionic Surfactant on Chemical Mechanical Planarization Performance in Alkaline Copper Slurry
6个月前
已完结
Synergetic effect of chelating agent and nonionic surfactant for benzotriazole removal on post Cu-CMP cleaning
6个月前
已完结
Study on the effect of nonionic surfactant in copper CMP slurry
6个月前
已完结
Study on the Effect of Nonionic Surfactant in Copper CMP Slurry
6个月前
已关闭
Effect of Intermolecular Interaction of Compound Surfactant on Particle Removal in Post-Cu CMP Cleaning
6个月前
已关闭
Two-step growth of β-Ga2O3 on c-plane sapphire using MOCVD for solar-blind photodetector
7个月前
已关闭
Enhancing the quality of homoepitaxial (−201) β-Ga2O3 thin film by MOCVD with in situ pulsed indium
7个月前
已完结
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