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140 积分 2024-10-11 加入
Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas
4个月前
已关闭
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma
4个月前
已完结
Plasma atomic layer etching for titanium nitride at low temperatures
4个月前
已完结
NF3 plasma-enhanced isotropic atomic layer etching of amorphous and crystalline hafnium oxide films
5个月前
已完结
Surface nanoparticle monitoring for plasma etching chamber components using single particle inductively coupled plasma mass spectrometry
9个月前
已关闭
Surface nanoparticle monitoring for plasma etching chamber components using single particle inductively coupled plasma mass spectrometry
9个月前
已关闭
SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam
10个月前
已完结
In situ atom-resolved observation of Si (111) 7x7 surface with F radical and Ar ion irradiation simulated atomic layer etching
11个月前
已完结
Plasma atomic layer etching of tantalum nitride with surface fluorination and Ar ion sputtering
11个月前
已完结
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination
11个月前
已完结
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