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41 积分 2021-10-27 加入
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride
1个月前
已完结
Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching
2个月前
已完结
Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas
3个月前
已关闭
Processing map to control the erosion of Y2O3 in fluorine based etching plasmas
3个月前
已完结
Y2O3 wall interactions in Cl2 etching and NF3 cleaning plasmas
3个月前
已关闭
Plasma etching behavior of Al2O3, Y2O3, YF3 and YOF under fluorocarbon plasma
3个月前
已完结
Understanding the contributions of F–, HF, and HF2– to the etching of SiO2 and unveiling the reaction kinetics to represent etching behavior of SiO2 up to pH 5
6个月前
已完结
Selective etching mechanism of silicon oxide against silicon by hydrogen fluoride: a density functional theory study
6个月前
已完结
High-efficiency Ca2+ doping all-inorganic nanocrystals (CsPbBr3 and CsPbBr1I2) encapsulated in a superhydrophobic aerogel inorganic matrix for white light-emitting diodes
11个月前
已完结
Strain‐Responsive Persistent Room‐Temperature Phosphorescence from Halogen‐Free Polymers for Early Damage Reporting through Phosphorescence Lifetime and Image Analysis
11个月前
已完结
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