Lv11
50 积分 2025-11-04 加入
Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography
48分钟前
待确认
Recent progress in polyaniline and its composites; Synthesis, properties, and applications
1个月前
已完结
Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography
1个月前
已完结
Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography
1个月前
已完结
EUV lithography patterning using multi-trigger resist
4个月前
已完结
Research on strain testing based on binocular stereo vision
4个月前
已完结
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
7个月前
已完结
Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges
9个月前
已完结
Advanced Development Techniques for Extreme-Tight Pitch Patterning
9个月前
已关闭
EUV resist modeling (PROLITH) for defect printability and stochastic behavior evaluation of 1Xnm DRAM technology node production
9个月前
已完结
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