Lv4
470 积分 2021-11-01 加入
Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability
5天前
已完结
A theoretical study of the atomic layer deposition of HfO2 on Si (1 0 0) surfaces using tetrakis (ethylmethylamino) hafnium and water
5天前
已完结
HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer
5天前
已完结
Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2 films deposited by ALD: A DFT study
5天前
已完结
Atomic layer deposition of a SnO 2 electron-transporting layer for planar perovskite solar cells with a power conversion efficiency of 18.3%
6天前
已完结
Atomic and Molecular Layer Deposition of Hybrid Mo–Thiolate Thin Films with Enhanced Catalytic Activity
7天前
已完结
Atomic layer deposition of stable 2D materials
7天前
已完结
Atomic layer deposition–state-of-the-art approach to nanoscale hetero-interfacial engineering of chemical sensors electrodes: A review
11天前
已完结
Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks
11天前
已完结
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