Lv41
416 积分 2025-05-16 加入
Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography
5小时前
待确认
Effects of an organotin compound on radiation-induced reactions of extreme-ultraviolet resists utilizing polarity change and radical crosslinking
5小时前
已完结
Dry Development of Dry Coated Sn‐Based Inorganic Resist for Defect‐Suppressed and High‐Resolution Patterning Process
1个月前
已完结
Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
1个月前
已完结
Directly patterned inorganic hardmask for EUV lithography
3个月前
已完结
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
3个月前
已完结
Nanoparticle photoresist studies for EUV lithography
3个月前
已完结
Photoacid generators. Application and current state of development
3个月前
已完结
Integrated fab process for metal oxide EUV photoresist
7个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
7个月前
已完结
皖公网安备34019202002308
