Lv31
330 积分 2025-05-16 加入
Directly patterned inorganic hardmask for EUV lithography
4小时前
待确认
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
4小时前
已完结
Nanoparticle photoresist studies for EUV lithography
4小时前
已完结
Photoacid generators. Application and current state of development
12天前
已完结
Integrated fab process for metal oxide EUV photoresist
4个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
4个月前
已完结
Enhancement of photosensitivity and stability of Sn-12 EUV resist by integrating photoactive nitrate anion
4个月前
已完结
Computational Study of Organotin Oxide Systems for Extreme Ultraviolet Photoresist
4个月前
已完结
Key Challenges and Opportunities for Advanced Extreme Ultraviolet Lithography Photoresist Materials
4个月前
已完结
High-resolution chemical patterns from negative tone resists for the integration of extreme ultraviolet patterns of metal-oxide resists with directed self-assembly of block copolymers
4个月前
已完结
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