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Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations
1天前
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Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition
1个月前
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Study of thermal properties of tetrakis(dimethylamido)zirconium as a precursor for atomic layer deposition processes
6个月前
已完结
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