Lv52
1228 积分 2022-10-08 加入
The Impact and Prevention of Latch-up in CMOS in VLSI Design
5小时前
已完结
Multi-source AdaBoost with cross-weight method for virtual metrology in semiconductor manufacturing
1天前
已完结
Metal gate etch-back planarization technology
8天前
已关闭
Gas cluster ion beam processing for improved self aligned contact yield at 7 nm node FinFET: MJ: MOL and junction interfaces
24天前
已完结
Influence of water background pressure on removal rates of SiO 2 , Si and photo resist in reactive ion beam etching
25天前
已完结
The evolution of configuration and final state of graphene on rough iron surface
1个月前
已完结
First Large-Scale (68 × 25 × 5 nm3) Atomistic Modeling for Accurate and Efficient Etching Process Based on Machine Learning Molecular Dynamics (MLMD)
2个月前
已完结
Computational Materials Science
4个月前
已完结
Transport and related properties of (Ga, Al)As/GaAs double heterostructure bipolar junction transistors
4个月前
已关闭
Gate Oxide Module Development for Scaled GAA 2D FETs Enabling SS<75mV/d and Record Idmax>900μA/μm at Lg<50nm
4个月前
已完结
皖公网安备34019202002308
