Lv2
140 积分 2024-05-31 加入
Dependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions
15天前
已完结
Plasma etch chemistry of aluminum and aluminum alloy films
15天前
已完结
Intergranular Corrosion of Pure Aluminium in Relation to the Behaviour of Grain-Boundaries during Melting*
15天前
已完结
Study of CF4, C2F6, SF6 and NF3 Decomposition Characteristics and Etching Performance in Plasma State
2个月前
已完结
Anisotropic Reactive Ion Etching of Aluminum Using Cl2, BCl3, and CH 4 Gases
3个月前
已完结
Tailored ion energy distributions on plasma electrodes
8个月前
已完结
Real-time, noninvasive monitoring of ion energy and ion current at a wafer surface during plasma etching
8个月前
已完结
Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage
8个月前
已完结
Trilevel reactive ion etching processes for fabrication of 60 nm germanium structures with high aspect ratio
8个月前
已完结
Effect of the RF bias on the plasma density in an argon inductively coupled plasma
8个月前
已完结
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