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70 积分 2026-05-20 加入
Molybdenum etching using an SF6, BCl3 and Ar based recipe for high aspect ratio MEMS device fabrication
13天前
已完结
The effect of Penning ionization reactions on the evolution of He with O2 admixtures plasma jets
14天前
已完结
Loading Effect during SiGe/Si Stack Selective Isotropic Etching for Gate-All-Around Transistors
1个月前
已完结
Selective Etching of SiO2 by Radical Recombination through NF3/H2 Pulsed RF Plasma
1个月前
已完结
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