Lv1
44 积分 2025-05-06 加入
A systematic investigation and statistical analysis of thermal Atomic Layer Deposition (ALD) process parameters on TiO2 thin film deposition rate using designed experiments
2个月前
已完结
Structural and optical properties of Nb-doped β-Ga2O3 thin films deposited by RF magnetron sputtering
3个月前
已完结
DUV-NIR dual-band photodetector based on Ga2O3/GaAs heterogeneous junctions
3个月前
已完结
Molecular beam epitaxial growth of HgCdTe mid-wave infrared dual-band detectors
3个月前
已完结
Reaction mechanism studies on the zirconium chloride–water atomic layer deposition process
4个月前
已完结
First Demonstration of CuCrO2/β-Ga2O3 p-n Heterojunction Diode With High Breakdown Voltage and Low Leakage Current
4个月前
已完结
First Demonstration of CuCrO2/β-Ga2O3 p-n Heterojunction Diode With High Breakdown Voltage and Low Leakage Current
4个月前
已关闭
Structural Optical and Electrical Transport Properties of ALD-Fabricated CuCrO2 Films
4个月前
已完结
First Demonstration of CuCrO2/β-Ga2O3 p-n Heterojunction Diode With High Breakdown Voltage and Low Leakage Current
4个月前
已关闭
Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
4个月前
已完结
皖公网安备34019202002308
