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60 积分 2025-04-22 加入
Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
5小时前
待确认
Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange
24天前
已完结
AURORA: A FORTRAN program for modeling well stirred plasma and thermal reactors with gas and surface reactions
28天前
已关闭
Electron ionization of NF3
29天前
已完结
Mechanism study of H2-plasma assisted Si3N4 layered etch
29天前
已完结
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