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50 积分 2025-04-22 加入
Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O2/Ar and NF3/Ar plasmas
12小时前
待确认
Smoothing Single-Crystalline SiC Surface with Reactive Ion Etching Using Pure NF3 and NF3/Ar Mixture Gas Plasmas
14小时前
已完结
Influence of the electron kinetics on Ar/NF3 inductively coupled plasma
15小时前
已完结
Influence of the electron kinetics on Ar/NF3 inductively coupled plasma
1天前
已完结
Mechanism of highly selective etching of SiCN by using NF3/Ar-based plasma
1天前
已完结
Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures
20天前
已完结
A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure
21天前
已完结
Investigation of tilted etching of Si3N4 using CF4/O2 plasma: Process development and mechanism study
1个月前
已完结
Plasma kinetics of c-C4F8 inductively coupled plasma revisited
1个月前
已完结
Dissociative properties of C4F6 obtained using computational chemistry
1个月前
已完结
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