Lv5
1310 积分 2021-05-08 加入
Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography
7小时前
求助中
Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography
2个月前
已完结
A Photocurable Polyurethane System with Reconfigurable Disulfide Bonds Featuring High Transmittance and Low Shrinkage
3个月前
已完结
新型高抗粘紫外纳米压印光刻胶的工艺研究
3个月前
已完结
Novel fluorinated compounds as release materials for nanoimprint lithography
3个月前
已完结
Low volume shrinkage, alkaline degradable UV nanoimprint lithography resists based on acrylic anhydride
3个月前
已完结
A Photocurable Polyurethane System with Reconfigurable Disulfide Bonds Featuring High Transmittance and Low Shrinkage
3个月前
已完结
Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography
4个月前
已完结
UV-Curable Polyurethane Acrylate Pressure-Sensitive Adhesives with High Optical Clarity for Full Lamination of TFT-LCD
7个月前
已完结
A novel and biocompatible photopolymerizable resin based on cyclohexanedimethanol-dimetacrylate designed to light-print microneedles
10个月前
已完结
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