Lv4
434 积分 2021-01-30 加入
The future of EUV lithography: enabling Moore's Law in the next decade
10小时前
待确认
At-wavelength metrology facility for soft X-ray reflection optics
10小时前
已完结
Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength
10小时前
已完结
The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II
10小时前
已完结
CO2/H2 treatment of p-type nanocrystalline silicon/intrinsic amorphous silicon interfaces on mass production line for efficiency improvement of silicon heterojunction solar cells
17天前
已完结
<title>Recent developments in EUV reflectometry at the Advanced Light Source</title>
23天前
已完结
Phase measurement of reflection of EUV multilayer mirror using EUV standing waves
1个月前
已完结
EUV/soft x-ray multilayer optics
1个月前
已完结
EUV multilayer optics
1个月前
已完结
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
1个月前
已完结
皖公网安备34019202002308
