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46 积分 2025-06-16 加入
Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists
1个月前
已完结
Synthesis and Fundamental Properties of Stable Ph3SnSiH3 and Ph3SnGeH3 Hydrides: Model Compounds for the Design of Si−Ge−Sn Photonic Alloys
1个月前
已完结
Transmission Electron Microscopy Unraveled Ionic Oxygen-Affinity Engineering of Metal Oxo Clusters with Extreme Ultraviolet Lithography Activity
2个月前
已完结
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
3个月前
已完结
Halogenated Metal‐Organic Clusters for High‐Resolution Extreme Ultraviolet Lithography Resists †
3个月前
已完结
Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography
4个月前
已完结
Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms
6个月前
已完结
Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy
6个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
7个月前
已完结
A Two-Dimensional Layered Heteropolyoxoniobate Based on Cubic Sn(IV)-Containing {Sn12Nb56O200} Cages with Good Proton Conductivity Property
8个月前
已完结
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