Lv1
36 积分 2025-06-16 加入
Tin-coordinated hybrid photoresists for dose-efficient EUV lithography
1个月前
已完结
Tin-coordinated hybrid photoresists for dose-efficient EUV lithography
1个月前
已完结
Development and characterization of high-quality 150 mm p-type 4H-SiC substrates using solution growth
2个月前
已完结
Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists
4个月前
已完结
Synthesis and Fundamental Properties of Stable Ph3SnSiH3 and Ph3SnGeH3 Hydrides: Model Compounds for the Design of Si−Ge−Sn Photonic Alloys
4个月前
已完结
Transmission Electron Microscopy Unraveled Ionic Oxygen-Affinity Engineering of Metal Oxo Clusters with Extreme Ultraviolet Lithography Activity
5个月前
已完结
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
6个月前
已完结
Halogenated Metal‐Organic Clusters for High‐Resolution Extreme Ultraviolet Lithography Resists †
6个月前
已完结
Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography
7个月前
已完结
Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms
9个月前
已完结
皖公网安备34019202002308
