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16 积分 2025-06-16 加入
Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms
1小时前
待确认
Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy
8天前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
23天前
已完结
A Two-Dimensional Layered Heteropolyoxoniobate Based on Cubic Sn(IV)-Containing {Sn12Nb56O200} Cages with Good Proton Conductivity Property
1个月前
已完结
Monoorganotin–polyoxometal-compounds. Part IV: Na2[(iPrSn3)(OV)4O10(OH)3]·5H2O·3DMSO, a novel branched tetravanadate(V) stabilized by a trimeric monoorganotin-oxo-hydroxo unit
2个月前
已完结
Tuning Optical and Electrical Properties of Vanadium Oxide with Topochemical Reduction and Substitutional Tin
2个月前
已完结
Enhancing the Polishing Efficiency of CeO2 Abrasives on the SiO2 Substrates by Improving the Ce3+ Concentration on Their Surface
3个月前
已完结
Study on uniform size and spherical CeO2 abrasives synthesized by two-step method and their chemical mechanical polishing performances
3个月前
已完结
Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy
3个月前
已完结
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