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46 积分 2025-06-16 加入
Development and characterization of high-quality 150 mm p-type 4H-SiC substrates using solution growth
17天前
已完结
Synthesis, Characterization, and Electron-Beam Lithography of Tetakis(Triphenylstannyl) Orthosilicate and Tetrakis(Triacetoxystannyl) Orthosilicate for the Development of Inorganic Molecular EUV Resists
3个月前
已完结
Synthesis and Fundamental Properties of Stable Ph3SnSiH3 and Ph3SnGeH3 Hydrides: Model Compounds for the Design of Si−Ge−Sn Photonic Alloys
3个月前
已完结
Transmission Electron Microscopy Unraveled Ionic Oxygen-Affinity Engineering of Metal Oxo Clusters with Extreme Ultraviolet Lithography Activity
4个月前
已完结
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
4个月前
已完结
Halogenated Metal‐Organic Clusters for High‐Resolution Extreme Ultraviolet Lithography Resists †
4个月前
已完结
Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography
6个月前
已完结
Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms
8个月前
已完结
Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy
8个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
9个月前
已完结
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