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Mitigating stochastics in EUV lithography by directed self-assembly
6天前
已完结
Roughness improvements with new high-chi block copolymers for EUV rectification directed self-assembly
7天前
已完结
Precision Microenvironment-Driven Isothermal Annealing for the Self-Assembly of Perpendicular Block Copolymers in High-Resolution Lithography Applications
8天前
已关闭
Directed block copolymer self-assembly for next-generation lithography
8天前
已完结
Improving 28nm pitch line and space EUV patterns by the directed self-assembly of block copolymers
8天前
已完结