Lv3
210 积分 2024-09-13 加入
Integration of E-beam mask writer corrections in MPC applications
1年前
已完结
PEC parameter optimization for EUV short-range effect utilizing MPC model calibration techniques
1年前
已完结
How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation
1年前
已完结
Adopting curvilinear shapes for production ILT: challenges and opportunities
1年前
已完结
Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
1年前
已完结
Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)
1年前
已完结
MPC simplification for established model-based mask process correction solutions
1年前
已完结
Performance of a variable shaped vector scan e-beam system for maskmaking
1年前
已完结
Variable shaped beam lithography capabilities enhancement by "small-shots" correction
1年前
已完结
An efficient tool to rewrite a VSB12 format jobdeck for any target VSB12 machine
1年前
已完结
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