Lv1
50 积分 2025-09-30 加入
Atomic layer etching of Sn by surface modification with H and Cl radicals
4个月前
已完结
Activation mechanism of ruthenium etching by Cl-based radicals in O2/Cl2 plasma
4个月前
已完结
Comparison of thermal stability of Mo/Si multilayers with different crystallinities of Mo layers
7个月前
已完结
Anomalous light scattering from multilayer coatings with nodular defects
7个月前
已完结
Investigating the partial plastic formation mechanism of typical scratches on silicon wafers induced by rogue particles during chemical mechanical polishing
7个月前
已完结
Cr and CrOx etching using SF6 and O2 plasma
9个月前
已完结
Focused, Nanoscale Electron-Beam-Induced Deposition and Etching
10个月前
已完结
ELECTRON IMPACT DISSOCIATIVE IONIZATION OF NITROSYL CHLORIDE
10个月前
已完结
Study of surface control during barrier layer etch
11个月前
已完结
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