Lv4
448 积分 2026-02-01 加入
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
5天前
已完结
Inhibitor-free area selective atomic layer deposition of SiO2 thin films by in situ surface cleaning using isotropic SiO2 selective removal
2个月前
已完结
Elucidating the surface chemistry of SiO2 and SiNx in hydrofluoric acid for area-selective atomic layer deposition of SiO2
2个月前
已完结
Investigation of convex/concave channel shaping with confined charge trap nitride for high-reliability 3D NAND flash applications
2个月前
已完结
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
4个月前
已完结
Vacuum ultraviolet enhanced atomic layer etching of ruthenium films
5个月前
已完结
Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process
7个月前
已完结
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