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Mechanisms of Force Magnetic Shear Combined with Chemical Rheological Polishing (Fms-Crp): A Case Study in Sapphire Processing
9天前
已完结
Liquid film shearing polishing for high quality and low damage tungsten surface: Process optimization, removal mechanism, and processing defects
16天前
已完结
Study on the Material Removal Mechanism of Cemented Carbide Magnetic Materials in Magnetic Field-Assisted Mass Polishing
1个月前
已完结
Surface Oxidation Properties of GaN wafers in Chemical Magnetorheological Polishing Process by Ultrasonic Action
1个月前
已完结
Material removal profile model simulations and experiments on the non-contact shear thickening polishing of K9 glass
1个月前
已完结
Material removal modes and processing mechanism in microultrasonic machining of ball ceramic tool
2个月前
已完结
Simulation of chemical reactions with methanol and oxalic acid on 4H-SiC surfaces before and after nanoabrasion
2个月前
已完结
Effects of polishing media on the surface chemical and micromechanical properties of SiC
2个月前
已完结
Surface morphological characteristics and mechanisms of laser-assisted electrochemical polishing on Inconel 718 alloy
4个月前
已完结
Investigation into atomistic reaction between abrasive and Co in H2O through ReaxFF MD and XPS
4个月前
已完结
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