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Aqueous materials for advanced lithography (Conference Presentation)
7天前
已关闭
Formulation Using Hansen Solubility Parameters
7天前
已完结
Interface engineering of underlayer of chemically-amplified EUV photoresists to enhance the photolithographic performance
8天前
已完结
PFAS-free EUV rinse for advanced technology nodes
13天前
已完结
Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography
23天前
已完结
Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry
25天前
已完结
Mechanisms of acid generation from ionic photoacid generators for extreme ultraviolet and electron beam lithography
25天前
已完结
Predicting the surface tension of mixed surfactant systems through theory and machine learning
30天前
已完结
Predicting the surface tension of mixed surfactant systems through theory and machine learning
1个月前
已完结
Non-ionic photo-acid generators for next-generation EUV photoresists
1个月前
已完结
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