Lv43
450 积分 2025-11-16 加入
Sub-100 mn p+/n junction formation using plasma immersion ion implantation
7小时前
已完结
A comparative study on ultra-shallow junction formation using co-implantation with fluorine or carbon in pre-amorphized silicon
7小时前
已完结
Role of silicon interstitials in boron cluster dissolution
7小时前
已完结
Defect evolution in ion implanted Si
7小时前
已关闭
Vacancy Engineering – An Ultra-Low Thermal Budget Method for High-Concentration 'Diffusionless' Implantation Doping
7小时前
已完结
Advances in ultrashallow doping of silicon
7小时前
已完结
Ion Implantation Defects and Shallow Junctions in Si and Ge
1天前
已完结
Shallow junction doping technologies for ULSI
1天前
已完结
Selective epitaxial growth of B-doped SiGe and HCl etch of Si for the formation of SiGe:B recessed source and drain
2天前
已完结