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380 积分
2024-01-28 加入
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Journey of MOSFET from Planar to Gate All Around: A Review
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Review of Semiconductor Flash Memory Devices for Material and Process Issues
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High-k/metal gate stacks in gate first and replacement gate schemes
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Gate-last vs. gate-first technology for aggressively scaled EOT logic/RF CMOS
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The Type and Solution of Inline Poly Residue Defect for 28 HK Process Improvement
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