Lv3
370 积分 2024-10-25 加入
Dependence of polymer main-chain structure on roughness formation of ArF photoresists in the plasma etching processes
5个月前
已完结
Effect of nonsolvent selection on determined solubility parameter of chlorinated polypropylene by turbidimetric titration
8个月前
已关闭
Modeling Sampling Strategy Optimization by Machine Learning Based Analysis
9个月前
已完结
Synthesis and properties of a series of sulfonate ester photoacid generators
9个月前
已完结
Synthesis and properties of ionic photoproduction of acid generators based on iodonium salts
9个月前
已关闭
Velocity of dissolution of polymers. Part I
10个月前
已完结
Synthesis, solvent interactions and Hansen solubility parameters of polyvinyl butyral
11个月前
已完结
The Study of 193 nm Photoresist
11个月前
已完结
Novel strategy for the design of highly transparent ArF resists with excellent dry etch resistance
1年前
已关闭
Enhanced Oil Recovery in Heterogeneous Carbonate Rocks Using a Gemini Surfactant under Harsh Conditions
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