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100 积分 2023-04-04 加入
Phonon Polariton-assisted Infrared Nanoimaging of Local Strain in Hexagonal Boron Nitride
17天前
已完结
P-Channel MoS2 Transistors: Enabling Complementary Logic Circuits for Next-Generation Electronics
1个月前
已关闭
Delamination of MoS2/SiO2 interfaces under nanoindentation
1个月前
已完结
Chromium oxide as a hard mask material better than metallic chromium
1个月前
已完结
Etch Characteristics of Al[sub 2]O[sub 3] in ICP and MERIE Plasma Etchers
1个月前
已完结
The Role of Oxygen on Anisotropy in Chromium Oxide Hard Mask Etching for Sub-Micron Fabrication
1个月前
已完结
Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas
1个月前
已关闭
Cr and CrOx etching using SF6 and O2 plasma
1个月前
已完结
Acid etching process for fabrication of Bi2Sr2CaCu2O8+x stack
5个月前
已完结
Study of chemically-etched Bi2Sr2−xCa1+xCu2O8+δ surfaces
5个月前
已完结
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