Lv3
280 积分 2022-12-13 加入
Effect of Al2O3 layer thickness on leakage current and dielectric properties of atomic layer deposited Al2O3/TiO2/Al2O3 nano-stack
2个月前
已完结
Optimization of a SiCl4-Ar inductively coupled plasma etching process for InP-based waveguide devices
3个月前
已完结
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect
5个月前
已完结
Optimization of a SiCl4-Ar inductively coupled plasma etching process for InP-based waveguide devices
10个月前
已完结
ICP-RIE etching of InP using CH4/H2, CH4/H2/Cl2, H2/Cl2 and Cl2: process development and optimization
10个月前
已完结
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