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80 积分 2025-02-18 加入
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
3个月前
已完结
Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect
4个月前
已关闭
Cyclic, Cryogenic, Highly Anisotropic Plasma Etching of Silicon Using SF6/O2
5个月前
已完结
Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmas
7个月前
已关闭
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