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40 积分 2025-11-26 加入
ESCA, XRD, and IR Characterization of Aluminum Oxide, Hydroxyfluoride, and Fluoride Surfaces in Correlation with Their Catalytic Activity in Heterogeneous Halogen Exchange Reactions
2个月前
已完结
High-pure AlN crystalline thin films deposited on GaN at low temperature by plasma-enhanced ALD
2个月前
已完结
PEALD AlN: Controlling growth and film crystallinity
2个月前
已完结
Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
2个月前
已完结
Plasma Power Effect on Crystallinity and Density of Peald-Aln Thin Films： Toward Increasing Dielectric Constant and Breakdown Electric Field
2个月前
已关闭
Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
2个月前
已完结
Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures
2个月前
已完结
Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
2个月前
已完结
Atomic layer deposition and characterization of scandium aluminum nitride
3个月前
已完结
Low-Temperature Layer-by-Layer Epitaxy of Ferroelectric Al 0.63 Sc 0.37 N Thin Films for Back-End-of-Line Integration
3个月前
已关闭
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