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20 积分 2023-03-28 加入
On temperature and flux dependence of isotropic silicon etching in inductively coupled SF6 plasma
2年前
已完结
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2
2年前
已完结
Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
2年前
已完结
Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
2年前
已完结
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
2年前
已完结
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