Lv2
192 积分 2024-11-14 加入
Mechanism of highly selective etching of SiCN by using NF3/Ar-based plasma
12小时前
已完结
Evolution of lithography-to-etch bias in multi-patterning processes
2天前
已完结
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism
2个月前
已完结
Atomistic Simulation of HF Etching Process of Amorphous Si3N4 Using Machine Learning Potential
2个月前
已完结
Simulation of silicon etching in NF3 plasma reactor
2个月前
已完结
Selective Etching of SiO2 by Radical Recombination through NF3/H2 Pulsed RF Plasma
3个月前
已完结
Modeling electromagnetic effects in capacitive discharges
3个月前
已完结
Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
4个月前
已完结
Si Epitaxial Growth on the Atomic-Order Nitrided Si(100) Surface in SiH4 Reaction
6个月前
已关闭
Assessment of STI dry etch process variability by means of dynamic time warping technique
6个月前
已关闭
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