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30 积分 2024-07-29 加入
(Liquid) Metallic Photoresist for Monolithic Microlithography of Elastic Electronics
1个月前
已完结
Design of Dual-Sensitive Functional Photoresist for UV Lithography
4个月前
已完结
Fluorine-Free, Low-Dielectric Photosensitive Polyimides Based on Methyl Methacrylate-Functionalized Bulky Diamines for High-Fidelity UV Patterning
4个月前
已关闭
Synthesis of molecularly tunable, dual-reactive poly(4-hydroxystyrene)-based photoresists via anionic polymerization, sequential deprotection, and reprotection reactions
4个月前
已完结
Spin-on Deposition of Amorphous Zeolitic imidazolate Framework (aZIF) Films for Lithography Applications
5个月前
已完结
Scalable heterostructures using photoresist-free patterning
5个月前
已完结
Thermally initiated intramolecular reactions of a polymer with gem-dichlorocyclopropane groups in the main chain
5个月前
已完结
Key Challenges and Opportunities for Advanced Extreme Ultraviolet Lithography Photoresist Materials
5个月前
已完结
Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers
6个月前
已完结
Nondestructive Direct Optical Patterning of Perovskite Nanocrystals with Carbene-Based Ligand Cross-Linkers
6个月前
已完结
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