Lv2
116 积分 2021-01-06 加入
Contact local CD uniformity optimization through etch shrink
4天前
已完结
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
17天前
已完结
Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE
19天前
已完结
Sidewall surface chemistry in directional etching processes
19天前
已完结
Through-silicon via etch uniformity enhancement and aspect-ratio influence on etch rate and profile
24天前
已完结
Topographic Complexities and Solutions for High Density BEOL MIM Capacitors
1个月前
已完结
Structure and property changes of ZrO2/Al2O3/ZrO2 laminate induced by low-temperature NH3 annealing applicable to metal–insulator–metal capacitor
1个月前
已完结
Selective plasma-enhanced atomic layer etching of ZrO2 over TiN for DRAM capacitor recess etching
1个月前
已关闭
A Cleaning Method for Post-Etch Ruthenium Residue Removal Using UV and Liquid Chemical
1个月前
已完结
Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors
1个月前
已完结
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