Lv4
782 积分 2023-09-05 加入
<title>Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists</title>
3天前
已完结
Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists
3天前
已完结
Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists
3天前
已完结
Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
3天前
已完结
Quantification of the resist dissolution process: an in situ analysis using high speed atomic force microscopy
4天前
已完结
The effect of resist dissolution process on pattern formation variability: anin situanalysis using high-speed atomic force microscopy
4天前
已完结
Acid evaporation property in chemically amplified resists
4天前
已完结
Resist formulation effects on contrast and top-loss as measured by 3D-SEM metrology
4天前
已完结
Limitation of blend type of resist platform on EUV lithography
4天前
已完结
Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists
4天前
已完结
皖公网安备34019202002308
