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30 积分 2023-10-17 加入
Anisotropic atomic layer etching of molybdenum by formation of chloride/oxychloride
10小时前
待确认
Defects and dopant behavior of a medium-dose range implant into heated silicon wafers
6个月前
已完结
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
1年前
已完结
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3
1年前
已完结
Selective isotropic atomic-layer etching of thin films by using dry chemical removal tool
1年前
已完结
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