Lv4
560 积分 2021-09-24 加入
Systematic DTCO flow for yield improvement at 14/12nm technology node
1年前
已完结
A Mask Correction Method for Surface Plasmon Lithography
1年前
已完结
A Mask Correction Method for Surface Plasmon Lithography
1年前
已完结
Active lens for thermal aberration compensation in lithography lens
1年前
已完结
DTCO acceleration to fight scaling stagnation
1年前
已完结
DTCO optimizes critical path nets to improve chip performance with timing-aware OPC in deep ultraviolet lithography
1年前
已完结
Litho-aware redundant local-loop insertion framework with convolutional neural network
2年前
已完结
Incorporating process variation contours in design rule calculation and SRAM design optimization
2年前
已完结
Projection-based high coverage fast layout decomposing algorithm of metal layer for accelerating lithography friendly design at full chip level
2年前
已完结
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