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30 积分 2025-12-25 加入
PFAS free materials and resist for ArF immersion photolithography
18天前
已完结
Phototunable and Photopatternable Polymer Semiconductors
23天前
已完结
Advances in metal-based photoresist materials for EUV lithography and lithographic mechanisms
23天前
已完结
Control of Presentation of Functional Ultraviolet Absorbers to the Surface of Photoresist Polymers Using Low Surface Energy Polymers
23天前
已完结
Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography
23天前
已完结
New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm
23天前
已完结
High patterning photosensitivity by a novel fluorinated copolymer formulated resist
25天前
已完结
Synthesis and evaluation of a novel fluorinated poly(hexafluoroisopropyl methacrylate) polymer coating for corrosion protection on aluminum alloy
1个月前
已完结
Synthesis and cationic photopolymerization of a new fluorinated oxetane monomer
1个月前
已完结
Molecular feature influence on ArF photoresist polymer dissolution behavior
2个月前
已完结
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