Lv13
50 积分 2025-12-25 加入
High-Resolution Photopatterning of Surface-Energy-Tunable Fluorinated Polymers as Versatile Templates for Solution-Processed Organic Electronics
9小时前
已完结
High-χ Poly(fluorinated methacrylate)-block-Poly(acetoxystyrene) Block Copolymers for Sub-5 nm Nanopatterning
1天前
已完结
Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning
1天前
已完结
Enhancing Performance of Cross-Linking Negative-Tone Chemically Amplified Photoresists by Controlling Interfacial Interactions via Molecular Hydrophilicity Adjustment
20天前
已完结
PFAS free materials and resist for ArF immersion photolithography
21天前
已完结
Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxane
1个月前
已完结
Embodiment of Light-Mediated Main-Chain Scissionable Functionality While Preserving the Structure of Conventional Photoimaging Copolymer
1个月前
已完结
Impact of molecular structure of polymer in 193 nm resist performance
1个月前
已完结
Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching
1个月前
已关闭
PFAS free materials and resist for ArF immersion photolithography
2个月前
已完结
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