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802 积分 2025-09-28 加入
Evaluation of subsurface damage inherent to polished GaN substrates using depth-resolved cathodoluminescence spectroscopy
4分钟前
待确认
Study on Electrochemical Corrosion and CMP of GaN in Different Oxidation Systems
2天前
已完结
Influence of Slurry Flow Rate on Material Removal Rate and Topography of Chemical Mechanically Planarizedc-Plane (0001) GaN Surface
2天前
已完结
Analysis of mechanically induced subsurface damage and its removal by chemical mechanical polishing for gallium nitride substrate
4天前
已完结
Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction
11天前
已完结
p-GaN HEMT current reference and current mirror for high temperature application
24天前
已完结
Progress and Challenges for Chemical Mechanical Polishing of Gallium Nitride
1个月前
已完结
Chemical and physical mechanisms of CMP of gallium nitride
1个月前
已完结
Chemical polishing of bulk and epitaxial GaN
1个月前
已完结
In-situ investigation into the atomic-scale removal behavior of gallium nitride
1个月前
已完结
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