Lv4
562 积分 2022-10-28 加入
Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma
5天前
已完结
Quantitative analysis of plasma-enhanced chemical vapor deposition mechanisms: Quantum chemical and plasma-fluid dynamics investigation on tetraethoxysilane/O2 plasma
5天前
已关闭
Computational study on silicon oxide plasma enhanced chemical vapor deposition (PECVD) process using tetraethoxysilane/oxygen/argon/helium
5天前
已完结
Controllable etching of MoS2 basal planes for enhanced hydrogen evolution through the formation of active edge sites
12天前
已完结
Etching Characteristics and Mechanisms of MoS2 2D Crystals in O2/Ar Inductively Coupled Plasma
12天前
已完结
ICP etching for InAs-based InAs/GaAsSb superlattice long wavelength infrared detectors
27天前
已完结
Inductively coupled plasma etching of III–V antimonides in BCl3/SiCl4 etch chemistry
1个月前
已完结
Study of Surface Treatments on InAs/GaSb Superlattice LWIR Detectors
1个月前
已完结
Reactive ion etching of GaSb and GaAlSb using SiCl4
1个月前
已完结
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