Lv4
752 积分 2022-10-28 加入
Controllable layer‐by‐layer etching of III–V compound semiconductors with an electron cyclotron resonance source
8天前
已完结
Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4
8天前
已完结
Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam
8天前
已完结
Atomic layer etching of GaAs(110) with Br2 studied by scanning tunneling microscopy
8天前
已完结
Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
8天前
已完结
Reactive ion etching: Optimized diamond membrane fabrication for transmission electron microscopy
8天前
已完结
Consistency and reproducibility in atomic layer deposition
9天前
已完结
Silicon nitride spacer etching selectively to silicon using CH3F/O2/He/SiCl4 plasma
9天前
已完结
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si
9天前
已完结
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