Lv4
562 积分 2022-10-28 加入
The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication
21天前
已完结
Inductively coupled plasma etching of GaN using SiCl4/Cl2/Ar for submicron-sized features fabrication
26天前
已完结
Investigation of surface reactions of etched SiN films using HF/PF3 gas mixture plasma under cryogenic conditions via in-line XPS: The role of ammonium salts in etch rate enhancement
1个月前
已完结
Reaction mechanism for HF based cryogenic plasma etching of SiO2
1个月前
已完结
Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma
3个月前
已完结
Quantitative analysis of plasma-enhanced chemical vapor deposition mechanisms: Quantum chemical and plasma-fluid dynamics investigation on tetraethoxysilane/O2 plasma
3个月前
已关闭
Computational study on silicon oxide plasma enhanced chemical vapor deposition (PECVD) process using tetraethoxysilane/oxygen/argon/helium
3个月前
已完结
Controllable etching of MoS2 basal planes for enhanced hydrogen evolution through the formation of active edge sites
3个月前
已完结
Etching Characteristics and Mechanisms of MoS2 2D Crystals in O2/Ar Inductively Coupled Plasma
3个月前
已完结
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