Lv41
460 积分 2022-10-28 加入
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments
4小时前
已完结
Method for improving dry etching end point detection based on change in time accumulation correlation of plasma emitting wavelengths
19天前
已完结
Chamber conditioning process development for improved inductively coupled plasma reactive ion etching of GaAs/AlGaAs materials
1个月前
已完结
A Two-Step-Recess Process Based on Atomic-Layer Etching for High-Performance
2个月前
已完结
Size-dependence of the dielectric breakdown strength from nano- to millimeter scale
3个月前
已完结
Dielectric breakdown mechanisms in gate oxides
3个月前
已完结
Passivating and low damaging plasma etching of GaN using Cl2 and SiCl4 for recessed gate MOSc-HEMT devices
3个月前
已完结
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si
3个月前
已完结
Demonstration of post-growth wavelength setting of VCSELs using high-contrast gratings
3个月前
已完结
Length dependence of in-plane polarizations anisotropy in GaInAsP/InP quantum-wire structures fabricated by dry etching and regrowth process
3个月前
已完结
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