Lv65
2190 积分 2023-02-04 加入
Critical issues of III–V compound semiconductor processing
6小时前
已完结
Electrical impedance analysis and etch rate maximization in NF3/Ar discharges
6小时前
已完结
Dry and Wet Etch Processes for NiMnSb Heusler Alloy Thin Films
7小时前
求助中
High rate dry etching of Ni0.8Fe0.2 and NiFeCo
7小时前
待确认
Recent discoveries on the acquisition of the highest levels of human performance
8小时前
已完结
The effects of ICP dry etching and HF wet etching on the morphology of SiO2 surface
2天前
已完结
Flow structure and agitation effect of liquid film flow formed by the two-fluid jet: prediction of etching rate distribution in wet processing
4天前
已完结
Wet chemical etching of NiFe, NiFeCo AND NiMnSb for magnetic device fabrication
7天前
已完结
Oxidation and wet etching behavior of sputtered Mo-Ti-Al films
8天前
已完结
Control of ferromagnetic properties of Ni80Fe20 thin films by voltage-induced oxidation
9天前
已完结
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