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870 积分 2021-10-15 加入
Enhancing performance of Ti-Zn-oxo clusters for advanced lithography: effect of vertical ionization potential on sensitivity
23小时前
已完结
Antimony‐Oxo‐Cluster‐Based Polymers as Positive‐Tone EBL/EUV Photoresists: Lithography Performance Enhancement by Network Structure Modulation
23小时前
已完结
Pioneering Carboxylated Zirconium Oxo Cluster Resist for Precision Nanoscale Patterning
1天前
待确认
Effect of organic ligand and metal nanocluster core structure on resist performance of inorganic-organic hybrid resist materials for EUV and EB lithography
1天前
已完结
Bismuth-oxo Clusters for Next Generation Extreme Ultraviolet Light Photolithography
1天前
已完结
Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography
1天前
已完结
Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance
1天前
已完结
High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
1天前
已完结
Molecular organometallic resists for EUV (MORE)
1天前
已完结
Review of recent advances in inorganic photoresists
1天前
已完结