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46 积分 2022-11-05 加入
Understanding the contributions of F–, HF, and HF2– to the etching of SiO2 and unveiling the reaction kinetics to represent etching behavior of SiO2 up to pH 5
5个月前
已完结
Interface Investigation on SiGe/Si Multilayer Structures: Influence of Different Epitaxial Process Conditions
9个月前
已完结
Area selective deposition for bottom-up atomic-scale manufacturing
9个月前
已完结
Surface Reactions in Microelectronics Process Technology
9个月前
已关闭
Unveiling Polycrystalline Silicon Channel Dissolution Mechanism in Wet Etching Process of 3D NAND Fabrication
10个月前
已完结
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