Lv5
1270 积分 2021-07-21 加入
Advances in full-chip three-dimensional resist modeling for low k1 EUV and DUV lithography
2小时前
待确认
Trade-off between inverse lithography mask complexity and lithographic performance
12小时前
待确认
Manufacturability study of masks created by inverse lithography technology (ILT)
12小时前
待确认
Curvilinear mask handling in OPC flow
12小时前
待确认
StarVector: Generating Scalable Vector Graphics Code from Images
6天前
已完结
Implementing Machine Learning for OPC retargeting
12天前
已完结
EUV mask synthesis with rigorous ILT for process window improvement
1个月前
已完结
Creation and Fixing of Lithography Hotspots with Synopsys Tools
1个月前
已完结
Directed self-assembly for advanced chips
1个月前
已完结
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond
1个月前
已完结
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