Lv7
3240 积分 2024-06-28 加入
Ionization region model of high power impulse magnetron sputtering of copper
2个月前
已完结
Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma
2个月前
已完结
Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
2个月前
已完结
Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor
2个月前
已完结
Transamination in Pulsed DC-Plasma Enhanced CVD Of Ti(C,N) From TDMAT
2个月前
已完结
Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias
2个月前
已完结
Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
2个月前
已完结
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects
5个月前
已完结
Selective ALD Mo Deposition in 10nm Contacts
5个月前
已完结
ALD Mo for Advanced MOL Local Interconnects
5个月前
已完结
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