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100 积分 2026-03-20 加入
Tailoring CeO₂ abrasive morphology and crystal facets for enhanced chemical mechanical polishing of SiO₂
6天前
已完结
Preparation of Surface Modified Ceria Nanoparticles as Abrasives for the Application of Chemical Mechanical Polishing (CMP)
16天前
已完结
Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process
16天前
已完结
Preparation and properties of tungsten-rhenium alloys resistant to ultra-high temperatures
3个月前
已完结
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