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12 积分 2025-04-14 加入
Contact hole shrink of 193nm NTD immersion resist
20天前
已完结
Fluoropolymers: brief history, fundamental chemistry, processing, structure, properties, and applications
4个月前
已完结
PFAS in semiconductor photolithography: a mass balance model
4个月前
已完结
Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing
4个月前
已完结
In Situ NMR Measurement of Reactivity Ratios for the Copolymerization of 3,4-Dimethoxystyrene and para-Substituted Styrene
4个月前
已完结
Understanding and Control of Polymer Distribution in Photoresists Using Liquid Chromatography for Enhanced Lithography Performance
6个月前
已完结
Reaction of 1,1,2-trifluoro-2-hexafluoro-2′-(heptafluoropropoxy)-propoxyethylene with amines or alcohols
6个月前
已完结
Towards standardized polymer solubility measurements using a parallel crystallizer
7个月前
已完结
Blob defect prevention in 193nm topcoat-free immersion lithography
7个月前
已完结
Molecular simulation-based developer screening for molecular glass photoresists
7个月前
已完结
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